Asylum Research

Galleries | Nanolithography & Nanomanipulation

 

Friction Force Lithography on Silicon

Friction force image of a patterned n-octadecyltrichlorosilane SAM on silicon using bias-assisted nanolithography.
The terminal methyl group is converted to a carboxyl group by a redox reaction as the biased tip passes over
the film in a predefined pattern. The bright areas in the image are the carboxyl groups which have much higher
friction than the surrounding methyl-terminated SAM film. 2µm scan. Imaged with the MFP-3D AFM.

 


Oxford Instruments Asylum Research, Inc. • 6310 Hollister Ave. • Santa Barbara, CA  93117 • +1-805-696-6466AFM.info@oxinst.com