Asylum Research

Galleries | Materials | Semiconductors



Stressed Silicon Nitride Membrane with Nickel Nanoparticles

An extremely thin (30nm) free standing silicon nitride membrane with nickel nanoparticles, following
heating with a short laser pulse.  The nanoparticles react with the substrate, and the induced stress in
the film creates large ripples in the membrane surface. 90µm scan. Imaged with a MFP-3D AFM.

Courtesy of S. MacLaren and K. Roos, University of Illinois at Urbana-Champaign.


Oxford Instruments Asylum Research, Inc. • 6310 Hollister Ave. • Santa Barbara, CA  93117 •