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Nanopatterned Si Substrate

A mask for this pattern was produced by drop-casting a colloidal suspension of 2µm polystyrene spheres on clean Si, producing a perfect hexagonally packed monolayer which is defect-free over millimeter dimensions. Fluoride ions were used to etch the triangular pattern in the voids between the microspheres. Removal of the masking spheres leaves the well-defined pattern of holes. Following subsequent microfabrication processes, these holes are filled with metals, producing a flat substrate with a large pattern of nano “lightning rods” for optical field enhancement and spectroscopic applications. 10µm scan. Imaged with the MFP-3D AFM.

Image courtesy of S. MacLaren and M. Graca,
University of Illinois at Urbana-Champaign.


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