Best Practices for Critical Dimension Measurements using AFM: Probe Selection and Data Analysis

The webinar broadcast at the following times:

[Session 1] May 15 at 8am PT | 11am ET | 4pm UK

[Session 2] May 15 at 6pm PT | May 16 at 9am China

Silicon photonics is the study and use of silicon as the optical medium to construct photonic systems such as lasers, detectors, optical communications systems, and more. Specifically, silicon and SiO2 patterns such as gratings, lines, and sawtooth facets are fabricated on silicon to manipulate light. Accurate characterization of these patterns is important for process development and device optimization. Atomic Force Microscopy (AFM) is a non-destructive, probe-based technique that scans a sharp tip over a surface of interest to generate images of a surface. AFM provides three-dimensional spatial resolution with little or no sample preparation, making it an indispensable tool for characterizing nano- and micro-scale surface structure. This webinar focuses on AFM probe selection and data analysis for a range of critical surface features encountered in the silicon photonics research field. 

In this webinar, you will learn:

• How AFM can be used to characterize high aspect ratio features
• Which AFM probes should be used to get best results
• How to analyze AFM data to characterize CD features